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AFM (Asylum Research MFP3D Atomic Force Microscope)
Located: Chapman B30
Uses: Allows the user to generate a topological image of their sample by rastering a tip across the surface.
Status: Installed
Specifications:
The MFP3D has multiple imaging modes including: Contact, constant force, constant height, lateral force, non-contact, AC (tapping), phase, Dual ACTM, Magnetic, electric force, and conductive AFM imaging. Non-imaging modes include: Force, force/Distance spectroscopy, force volume mapping, nanolithography and nanomanipulation, and Current/Voltage (I/V) spectroscopy.
The scanner allows for scan sizes as large as 90 µm, and a vertical range of 15 µm. Samples can be imaged in either air or in fluid, and a series of heaters are available for temperature dependant studies (RT-300ºC in air or RT-80ºC in fluid). The ORCA module allows for current measurements between the sample and a conductive tip, and the magnetic field module can apply magnetic fields in the plane of the sample. In addition, the AFM head can be mounted on our inverted optical microscope to do simultaneous optical and AFM measurements.
AFM Operation Checklist
AFM Image Processing |
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Last Updated on Tuesday, 05 October 2010 14:19 |
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 Confocal Microscope Olympus Microscope with CARVII spinning disc confocal system
Located: Chapman Hall – B30
Uses: This microscope can do a number of different experiments including confocal, widefield fluorescence, brightfield, DIC and phase imaging.
Status: Installed
Objectives:
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Objective
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Numerical Aperture
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10x
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0.3
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20x
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0.45
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40x
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0.6
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60x, water
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1.2
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100x, oil
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1.3
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100x, oil
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1.4
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| Filter Set | Excitation | Emission |
| DAPI |
381-393nm |
417-477nm |
| GFP |
464-500nm |
516-556nm |
| TxRED |
542-582nm |
604-644nm |
| Camera | Resolution | Sensitivity | Maximum Frame Rate |
| Hamamatsu ORCA |
High (1344 x 1024) |
Medium |
~5 full frames/sec |
| Photometrics QuantEM |
Medium (512 x 512) |
High |
~30 full frames/sec |
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Last Updated on Tuesday, 05 October 2010 13:32 |
 ESEM (FEI Quanta 200 Field Emission Gun)
Located: Chapman Hall – B30
Uses: To obtain secondary & backscatter electron images of materials, polymers and biological samples at relatively low pressures (upto 5 Torr).
Status: Installed
Specifications:
FEI Quanta 200 FEG is a ESEM with a shottky field emission gun. ESEM mode enables analysis of non-conductive samples.
- Accelerating voltage = 0.5 to 30kV
- Operation Modes: High vacuum (HV), Low vacuum(LV) and Environmental SEM (ESEM)
- Magnification: HV & LV mode:7x-1 million x
- Resolution: HV & ESEM mode: 3.5nm at 30kV. LV mode: 15nm at 3kV
- Tilt Angle: -15°- + 75°
- Eucentric Goniometer Stage: x=50mm,y=50mm, z-clearance=55mm
- Equipped with a Peltier stage for in-situ studies of wet sample (-20°C - 100°C)
ESEM Operation Checklist:
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Last Updated on Tuesday, 05 October 2010 14:19 |
 FIB (FEI Helios 600 Nanolab Dual Beam System)
Located: Chapman Hall - Chapman B30
Uses: The dual electron and ion beam system allows for simultaneous SEM imaging and ion beam patterning (selective removal or addition of material).
Status: Installed
Ion Beam Specifications:
- The Sidewinder FIB column consists of a gallium liquid metal ion source (LMIS).
- Resolution: 5nm
- Max horizontal field width: 2.5mm @ 5kV (corresponds to 50x minimum magnification)
- Accelerating voltage: 1 – 30 kV
- Probe current: 1.5 pA - 20 nA
Electron Beam Specifications:
The field emission electron column is equipped with an ultra-high brightness emitter and magnetic immersion lens technology.
- Resolution: 0.9 nm at 15 kV, 1.5 nm at 1 kV
- Accelerating voltage: 0.5 – 30 kV
- Beam current: 20 nA
- Detection: in-lens SE and BSE
Gas Injection System (GIS) Capabilities:
5 GIS ports available
Currently available GIS chemistries:
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- I nsulator Deposition (TEOS)
- Platinum Deposition (ion or electron beam deposition)
- Tungsten Deposition (ion or electron beam deposition)
- Insulato r Enhanced Etch (XeF 2): selectively removes insulating materials while inhibiting the removal of conducting materials
FIB Operation Checklist
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Last Updated on Tuesday, 05 October 2010 14:20 |
 SEM (Hitachi S-4700 Cold Cathode Field Emission Scanning Electron Microscope)
Located: Chapman Hall - 030A
Uses: Obtain a three dimensional image of a sample on the nanometer to micron scale.
Status: Installed
Specifications:
The Hitachi S-4700 SEM is equipped with a snorkel lens that allows for both an upper through-the-lens (TTL) detector and a lower Everhart-Thornley (E-T) detector.
- Accelerating voltage = 0.5 to 30 kV
- Magnification up to 500,000x
- Resolution of: 1.5nm at 15kV accelerating voltage and 12mm working distance 2.5nm at 1kV accelerating voltage and 2.5mm working distance
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Last Updated on Monday, 11 April 2011 16:00 |
 TEM (JEOL 100 CX II)
Located: Chapman Hall – B26B
Uses: To obtain relatively low magnification transmission electron images of materials, polymers and biological samples.
Status: Installed
Specifications:
JEOL 100CX II TEM (Side Entry Goniometer) is a traditional TEM with a tungsten filament. The scope is equipped with a 2K X 2K Gatan CCD side mount camera.
- Accelerating voltage = Variable kV (20, 40, 60, 80, 100kV)
- Operation Modes: Bright Field, Dark Field and Diffraction.
- Magnification: STD Mag Mode: 360x-320kX
- Resolution: 2Å (lattice) and 3Å (point to point)
- Tilt Angle: Single Axis Tilt ± 60°
- Sample Holder: 2 Specimens
TEM JEOL 100 CX II Operation Checklist
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Last Updated on Tuesday, 05 October 2010 14:20 |
 TEM (JEOL 2010F-FasTEM)
Located: Chapman Hall – B26C
Uses: To obtain high resolution transmission electron (HRTEM) images of materials.
Status: Installed
Specifications:
JEOL 2010F FasTEM is a HRTEM with a Zirconated tungsten thermal field emmision tip. The scope is equipped with a 2K X 2K Gatan CCD bottom mount camera.
- Accelerating voltage = Variable kV (80, 100, 120, 200kV)
- Operation Modes: Bright Field, Dark Field, STEM and Diffraction.
- Magnification: STD Mag mode: 2kX-1.2 million X
- Resolution: TEM: 1Å (lattice) and 2.3Å (point to point)
- Resolution: STEM: 2.3Å (point to point)
- Sample Holder: JEOL Single and Double tilt analytical stage, single specimen.
- Tilt Angle: ± 20°
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Last Updated on Wednesday, 29 September 2010 13:52 |
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Instrumentation
