Hitachi S-4700 Cold Cathode Field Emission Scanning Electron Microscope

Located: Chapman Hall – 030A

Uses: Obtain a three dimensional image of a sample on the nanometer to micron scale.

The Hitachi S-4700 SEM is equipped with a snorkel lens that allows for both an upper through-the-lens (TTL) detector and a lower Everhart-Thornley (E-T) detector.

  • Accelerating voltage = 0.5 to 30 kV
  • Magnification up to 500,000x
  • Resolution of: 1.5nm at 15kV accelerating voltage and 12mm working distance 2.5nm at 1kV accelerating voltage and 2.5mm working distance

Scanning Electron Microscope


FEI Quanta 200 Field Emission Gun

Located: Chapman Hall – B30

Uses: To obtain secondary & backscatter electron images of materials, polymers and biological samples at relatively low pressures (upto 5 Torr).

FEI Quanta 200 FEG is a ESEM with a shottky field emission gun. ESEM mode enables analysis of non-conductive samples.

  • Accelerating voltage = 0.5 to 30kV
  • Operation Modes: High vacuum, HV, Low vacuum, LV, and Environmental SEM, ESEM.
  • Magnification: HV & LV mode:7x-1 million x
  • Resolution: HV & ESEM mode: 3.5nm at 30kV. LV mode: 15nm at 3kV
  • Tilt Angle: -15°- + 75°
  • Eucentric Goniometer Stage: x=50mm,y=50mm, z-clearance=55mm
  • Equipped with a Peltier stage for in-situ studies of wet sample, -20°C – 100°C

ield Emission Gun


FEI Helios 600 Nanolab Dual Beam System

Located: Chapman Hall – B30

Uses: The dual electron and ion beam system allows for simultaneous SEM imaging and ion beam patterning with selective removal or addition of material.

Ion Beam Specifications:

  • The Sidewinder FIB column consists of a gallium liquid metal ion source, LMIS.
  • Resolution: 5nm
  • Max horizontal field width: 2.5mm @ 5kV, corresponds to 50x minimum magnification.
  • Accelerating voltage: 1 – 30 kV
  • Probe current: 1.5 pA – 20 nA

Electron Beam Specifications:
The field emission electron column is equipped with an ultra-high brightness emitter and magnetic immersion lens technology.

  • Resolution: 0.9 nm at 15 kV, 1.5 nm at 1 kV
  • Accelerating voltage: 0.5 – 30 kV
  • Beam current: 20 nA
  • Detection: in-lens SE and BSE

Gas Injection System, GIS, Capabilities:
5 GIS ports available

Currently available GIS chemistries:

  • Insulator Deposition, TEOS
  • Platinum Deposition, ion or electron beam deposition
  • Tungsten Deposition, ion or electron beam deposition
  • Insulator Enhanced Etch, XeF 2, selectively removes insulating materials while inhibiting the removal of conducting materials

Nanolab Dual Beam System



Located: Chapman Hall – B26B

Uses: To obtain relatively low magnification transmission electron images of materials, polymers and biological samples.

JEOL 100CX II TEM, Side Entry Goniometer, is a traditional TEM with a tungsten filament. The scope is equipped with a 2K X 2K Gatan CCD side mount camera.

  • Accelerating voltage = Variable kV, 20, 40, 60, 80, 100kV
  • Operation Modes: Bright Field, Dark Field and Diffraction.
  • Magnification: STD Mag Mode: 360x-320kX
  • Resolution: 2Å, lattice, and 3Å, point to point
  • Tilt Angle: Single Axis Tilt ± 60°
  • Sample Holder: 2 Specimens




Located: Chapman Hall – B26C

Uses: To obtain high resolution transmission electron, HRTEM, images of materials.

JEOL 2010F FasTEM is a HRTEM with a Zirconated tungsten thermal field emmision tip. The scope is equipped with a 2K X 2K Gatan CCD bottom mount camera.

  • Accelerating voltage = Variable kV, 80, 100, 120, 200kV
  • Operation Modes: Bright Field, Dark Field, STEM and Diffraction.
  • Magnification: STD Mag mode: 2kX-1.2 million X
  • Resolution: TEM: 1Å, lattice, and 2.3Å, point to point
  • Resolution: STEM: 2.3Å, point to point
  • Sample Holder: JEOL Single and Double tilt analytical stage, single specimen.
  • Tilt Angle: ± 20°


Asylum Research MFP3D Atomic Force Microscope

Located: Chapman Hall – 225

Uses: Allows the user to generate a topological image of their sample by rastering a tip across the surface.

The MFP3D has multiple imaging modes including: Contact, constant force, constant height, lateral force, non-contact, AC, tapping, phase, Dual ACTM, Magnetic, electric force, and conductive AFM imaging. Non-imaging modes include: Force, force/Distance spectroscopy, force volume mapping, nanolithography and nanomanipulation, and Current/Voltage, I/V, spectroscopy.

The scanner allows for scan sizes as large as 90 µm, and a vertical range of 15 µm. Samples can be imaged in either air or in fluid, and a series of heaters are available for temperature dependant studies, RT-300ºC in air or RT-80ºC in fluid. The ORCA module allows for current measurements between the sample and a conductive tip, and the magnetic field module can apply magnetic fields in the plane of the sample. In addition, the AFM head can be mounted on our inverted optical microscope to do simultaneous optical and AFM measurements.

Asylum Research MFP3D Atomic Force Microscope

Confocal Microscope

Olympus Microscope with CARVII spinning disc confocal system

Located: Chapman Hall – 225

Uses: This microscope can do a number of different experiments including confocal, widefield fluorescence, brightfield, DIC and phase imaging.

Objective Numerical Aperture
10x 0.3
20x 0.45
40x 0.6
60x, water 1.2
100x, oil 1.3
100x, oil 1.4


Filter Set Excitation Emission
DAPI 381-393nm 417-477nm
GFP 464-500nm 464-500nm
TxRED 542-582nm 604-644nm
Camera Resolution Sensitivity Max Frame Rate
Hamamatsu ORCA High - 1344 x 1024 Medium ~5 full frames/sec
Photometrics QuantEM Medium - 512 x 512 High ~30 full frames/sec

Confocal Microscope


MSP - Microspectrophotometer

Located: Chapman Hall – 313

Uses: The microspectrophotometer is an instrument used to measure the transmittance, absorbance, reflectance, polarization, fluorescence and luminescence spectra of microscopic samples in the ultraviolet, visible and infrared wavelength, UV-VIS-NIR, range. It is also capable of non-destructive and non-contact colorimetry and thin film thickness measurement. Raman capability is accomplished with the included laser light source.


  • Craic 20/30 PV microspectrophotometer is based on a Zeiss photo microscope using Lambda and LambdaFire software.
  • UV-VIS-NIR spectral range from 300-2100 nm
  • Included light sources: Xenon, Mercury vapor, Halogen and 532 nm laser
  • Magnification: Zeiss 10x, 20x, 50x and 100x dry lenses, N.A. 0.4-1.4
  • Fluorescent filter cubes: Zeiss 260, 420, 560, 920 nm
  • Stage: Prior motorized stage

MSP - Microspectrophotometer

Electron Microscopy Sample Preparation

Materials Samples

The preparation of materials based specimens, such as particles, fibers, nanotubes, nanorods, films, et cetera, for SEM and TEM is fairly straight forward and can be performed by the user with some guidance from CHANL. Small, dry SEM specimens can be mounted onto sample stubs and a conductive coating can be applied with our sputter coater if necessary. For TEM small particulates are usually suspended in solution, sonicated if necessary, and then applied to grids either as a timed precipitation or by evaporative means. A negative stain may be applied to these specimens if needed.

Biolgical Samples

Biological samples should be "fixed," usually with aldehyde fixatives and dehydrated. For SEM imaging, the samples should be critical point dried then mounted onto specimen stubs and coated with metal. For TEM imaging, dehydrated samples must also be infiltered and embedded with a resin to produce a cured block which is then sectioned. The sections produced can be suitable for light microscopy or for TEM. CHANL staff are available to prepare biological samples as needed.

Electron Microscopy Supplies Provided:

  • Mounting tapes, colloidal metal solutions, special holders and grids
  • Fixatives are made as needed
  • Heavy metal stains used are OsO4, Lead citrate, Uranyl acetate, Phosphotungstic acid
  • Ancillary equipment: Tousimis critical point dryer, Cressington sputter coater
  • Several resins and formulations are available
  • Sectioning with an ultramicrotome equipped with a diamond knife


Sorvall MT6000

Located: Chapman Hall – 030

Uses: Creating thin sections of a sample for SEM or TEM imaging.

Key Features Include:

  • Microprocessor control system
  • Sections from 50nm, ultrathin, to 2µm, thick
  • Variable position stereozoom microscope
  • Variable position overhead light
  • Fiber optics backlight
  • VisuTrac programming
  • Air table for reduced vibration

Cryo Ultramicrotome

Leica EM UC7 and UFC7

Located: Chapman Hall – 313

Specifications: State of the art cryoultramicrotome for making frozen sections of polymers and other samples difficult to section at room temperatures.


  • Leica optics
  • Diamond knives for sectioning and block facing
  • Quick change from conventional to cryo mode
  • Touch pad control center
  • Manual at instrument

Critical Point Dryer

Tousimis Semidri PVT-3

Located: Chapman Hall – 030A

Uses: Dehydrating biological samples without causing deformation in preparation for SEM imaging.

Key Features Include:

  • Manual flow control for INLET and EXHAUST micro metering valves.
  • Vernier handles on all metering valves allow for reproducible settings.
  • Internal surfaces inert to LCO2 and ultra-pure alcohols.
  • Integrated automatic temperature control.
  • EZ top loading process chamber.
Critical Point Dryer

Sputter Coater

Cressington 108 Auto Sputter Coater

Located: Chapman Hall – 030A

Uses: Coating samples with a thin layer of metal to prevent charging in the SEM

Key Features Include:

  • Au/Pd target, 57mm x 0.1mm
  • Microprocessor based
  • Digitally selectable current, 10, 20, 30, and 40 mA
  • Holds 12 ½” stubs
  • Automatic process sequencing
  • Full manual override
  • Digital timer, 5-300 seconds with pause
  • Integrated thickness monitor
Sputter Coater


Chapel Hill Analytical & Nanofabrication Laboratory
243 Chapman Hall, CB# 3216
University of North Carolina
Chapel Hill, NC 27599-3216


Chapman Hall

Chapman Hall at the University of North Carolina