Equipped with a Peltier stage for in-situ studies of wet sample, -20°C – 100°C
FEI Helios 600 Nanolab Dual Beam System
Located: Chapman Hall – B30
Uses: The dual electron and ion beam system allows for simultaneous SEM imaging and ion beam patterning with selective removal or addition of material.
Ion Beam Specifications:
The Sidewinder FIB column consists of a gallium liquid metal ion source, LMIS.
Max horizontal field width: 2.5mm @ 5kV, corresponds to 50x minimum magnification.
Accelerating voltage: 1 – 30 kV
Probe current: 1.5 pA – 20 nA
Electron Beam Specifications: The field emission electron column is equipped with an ultra-high brightness emitter and magnetic immersion lens technology.
Resolution: 0.9 nm at 15 kV, 1.5 nm at 1 kV
Accelerating voltage: 0.5 – 30 kV
Beam current: 20 nA
Detection: in-lens SE and BSE
Gas Injection System, GIS, Capabilities: 5 GIS ports available
Currently available GIS chemistries:
Insulator Deposition, TEOS
Platinum Deposition, ion or electron beam deposition
Tungsten Deposition, ion or electron beam deposition
Insulator Enhanced Etch, XeF 2, selectively removes insulating materials while inhibiting the removal of conducting materials
TEM JEOL 100CX II
Located: Chapman Hall – B26B
Uses: To obtain relatively low magnification transmission electron images of materials, polymers and biological samples.
Specifications: JEOL 100CX II TEM, Side Entry Goniometer, is a traditional TEM with a tungsten filament. The scope is equipped with a 2K X 2K Gatan CCD side mount camera.
Accelerating voltage = Variable kV, 20, 40, 60, 80, 100kV
Operation Modes: Bright Field, Dark Field and Diffraction.
Magnification: STD Mag Mode: 360x-320kX
Resolution: 2Å, lattice, and 3Å, point to point
Tilt Angle: Single Axis Tilt ± 60°
Sample Holder: 2 Specimens
TEM JEOL 2010F-FasTEM
Located: Chapman Hall – B26C
Uses: To obtain high resolution transmission electron, HRTEM, images of materials.
Specifications: JEOL 2010F FasTEM is a HRTEM with a Zirconated tungsten thermal field emmision tip. The scope is equipped with a 2K X 2K Gatan CCD bottom mount camera.
Accelerating voltage = Variable kV, 80, 100, 120, 200kV
Operation Modes: Bright Field, Dark Field, STEM and Diffraction.
Magnification: STD Mag mode: 2kX-1.2 million X
Resolution: TEM: 1Å, lattice, and 2.3Å, point to point
Resolution: STEM: 2.3Å, point to point
Sample Holder: JEOL Single and Double tilt analytical stage, single specimen.
Tilt Angle: ± 20°
Asylum Research MFP3D Atomic Force Microscope
Located: Chapman Hall – 225
Uses: Allows the user to generate a topological image of their sample by rastering a tip across the surface.
Specifications: The MFP3D has multiple imaging modes including: Contact, constant force, constant height, lateral force, non-contact, AC, tapping, phase, Dual ACTM, Magnetic, electric force, and conductive AFM imaging. Non-imaging modes include: Force, force/Distance spectroscopy, force volume mapping, nanolithography and nanomanipulation, and Current/Voltage, I/V, spectroscopy.
The scanner allows for scan sizes as large as 90 µm, and a vertical range of 15 µm. Samples can be imaged in either air or in fluid, and a series of heaters are available for temperature dependant studies, RT-300ºC in air or RT-80ºC in fluid. The ORCA module allows for current measurements between the sample and a conductive tip, and the magnetic field module can apply magnetic fields in the plane of the sample. In addition, the AFM head can be mounted on our inverted optical microscope to do simultaneous optical and AFM measurements.
Olympus Microscope with CARVII spinning disc confocal system
Located: Chapman Hall – 225
Uses: This microscope can do a number of different experiments including confocal, widefield fluorescence, brightfield, DIC and phase imaging.
Max Frame Rate
High - 1344 x 1024
~5 full frames/sec
Medium - 512 x 512
~30 full frames/sec
MSP - Microspectrophotometer
Located: Chapman Hall – 313
Uses: The microspectrophotometer is an instrument used to measure the transmittance, absorbance, reflectance, polarization, fluorescence and luminescence spectra of microscopic samples in the ultraviolet, visible and infrared wavelength, UV-VIS-NIR, range. It is also capable of non-destructive and non-contact colorimetry and thin film thickness measurement. Raman capability is accomplished with the included laser light source.
Craic 20/30 PV microspectrophotometer is based on a Zeiss photo microscope using Lambda and LambdaFire software.
UV-VIS-NIR spectral range from 300-2100 nm
Included light sources: Xenon, Mercury vapor, Halogen and 532 nm laser
The preparation of materials based specimens, such as particles, fibers, nanotubes, nanorods, films, et cetera, for SEM and TEM is fairly straight forward and can be performed by the user with some guidance from CHANL. Small, dry SEM specimens can be mounted onto sample stubs and a conductive coating can be applied with our sputter coater if necessary. For TEM small particulates are usually suspended in solution, sonicated if necessary, and then applied to grids either as a timed precipitation or by evaporative means. A negative stain may be applied to these specimens if needed.
Biological samples should be "fixed," usually with aldehyde fixatives and dehydrated. For SEM imaging, the samples should be critical point dried then mounted onto specimen stubs and coated with metal. For TEM imaging, dehydrated samples must also be infiltered and embedded with a resin to produce a cured block which is then sectioned. The sections produced can be suitable for light microscopy or for TEM. CHANL staff are available to prepare biological samples as needed.
Electron Microscopy Supplies Provided:
Mounting tapes, colloidal metal solutions, special holders and grids
Fixatives are made as needed
Heavy metal stains used are OsO4, Lead citrate, Uranyl acetate, Phosphotungstic acid