SPECTROSCOPY TOOLS

XPS

Kratos Axis Ultra DLD X-ray Photoelectron Spectrometer

Located: Chapman Hall – 030C

Uses: Allows the user to determine the elemental composition of the top ~10 nm of the sample surface.

Specifications:
The Kratos Axis Ultra DLD is equipped with two X-ray sources, a monochromatic Al K alpha source for high energy resolution work, and a dual anode Mg and Al source. It contains a hemispherical and a spherical mirror energy analyzer and a delay line detector which allows for operation in both a spectroscopic and an imaging mode. Insulating samples can be easily analyzed by using the integral charge neutralizer system. The system can be operated in one of three modes: large spot spectroscopy, small spot spectroscopy, and parallel imaging, elemental mapping. The sample stage has temperature control from -150°C to +600°C.

Spectral Resolution, using monochromatic Al K alpha source:

  • 0.48 eV for Ag 3d 5/2 on clean silver
  • 0.68 eV for C 1s on the ester peak of clean polyethylene terephthalate, PET
  • Small spot spectroscopy analysis sizes:
  • 110 µm, 55 µm, 27 µm, and 15 µm
  • Spatial resolution in imaging mode:
  • <3 µm (defined as the 20% to 80% signal rise across a sharp edge)

Kratos Axis Ultra DLD

UPS

Kratos Axis Ultra DLD Ultraviolet Photoelectron Spectrometer

Located: Chapman Hall – 030C

Uses: Allows the user to determine the workfunction and the ionization energy of their sample.

Specifications:
The Kratos Axis Ultra DLD is equipped with a helium (He) ultraviolet source allowing for excitation with either the He I ( 21.2 eV) or He II (40.8 eV) lines. Radiation at these wavelengths probes the valence electrons and t he resulting photoelectron spectrum contains a series of peaks each corresponding to valence-region molecular orbital energy levels. The He I source can provide 2,000,000 counts per second at 140 meV resolution on clean polycrystalline silver.


Kratos Axis Ultra DLD

EDS on TEM

Oxford instruments, INCA Energy TEM 250

Located: JEOL 2010F – Chapman B26C

Uses: Obtain site specific semi-quantitative elemental analysis of samples.

Features:

  • Silicon drift detector
  • 80mm2 detector area with 129 eV or better energy resolution
  • Excellent low energy performance and the ability to detect elements down to Be.
  • INCA energy software is based around a Navigator and can be run on the Analyser, Point and ID and Mapping mode.
  • INCA Energy TEM 250 is installed on the JEOL 2010F TEM.

JEOL 2010F

EDS on SEM

EDS Oxford instruments, INCA PentaFET -x3

Located: Hitachi S-4700 – Chapman 030A; FEI Helios 600 Nanolab – Chapman 030B

Uses: Obtain site specific semi-quantitative elemental analysis of samples.

Features:

  • Si(Li) detector
  • 30mm2 allows to collect data up to 3x the traditional 10mm2 Si(Li) detector.
  • Excellent low energy performance and the ability to detect elements down to Be.
  • INCA energy software is based around a Navigator and can be run on the Analyser, Point and ID and Mapping mode.
  • INCA PentaFet –x3 is installed on the Hitachi S-4700 FESEM and the FEI Helios 600 Nanolab Dual Beam FIB System.

Nanolab Dual Beam System

Ellipsometer

J. A. Woollam Variable Angle Spectroscopic Ellipsometer

Located: Chapman Hall – B04

Uses: Allows a very precise determination of film thicknesses when the optical constants of the films are known.

Specifications:

  • Spectral Range: 250-2300 nm, 250-1700 nm at angles 20° to 90°; 1700-2300 nm at angles 35° to 90°
  • Focusing optics are available to reduce the beam size to 100 mm for wavelengths between 250-1700 nm and angles between 20°-90°

Ellipsometer

MSP

MSP - Microspectrophotometer

Located: Chapman Hall – 313

Uses: The microspectrophotometer is an instrument used to measure the transmittance, absorbance, reflectance, polarization, fluorescence and luminescence spectra of microscopic samples in the ultraviolet, visible and infrared wavelength, UV-VIS-NIR, range. It is also capable of non-destructive and non-contact colorimetry and thin film thickness measurement. Raman capability is accomplished with the included laser light source.

Specifications:

  • Craic 20/30 PV microspectrophotometer is based on a Zeiss photo microscope using Lambda and LambdaFire software.
  • UV-VIS-NIR spectral range from 300-2100 nm
  • Included light sources: Xenon, Mercury vapor, Halogen and 532 nm laser
  • Magnification: Zeiss 10x, 20x, 50x and 100x dry lenses, N.A. 0.4-1.4
  • Fluorescent filter cubes: Zeiss 260, 420, 560, 920 nm
  • Stage: Prior motorized stage

MSP - Microspectrophotometer

CONTACT US

Chapel Hill Analytical & Nanofabrication Laboratory
243 Chapman Hall, CB# 3216
University of North Carolina
Chapel Hill, NC 27599-3216

cdonley@email.unc.edu
919-843-2859
919-843-8412

Chapman Hall

Chapman Hall at the University of North Carolina