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microscopy
fabrication
spectroscopy

ALD

Description: Atomic Layer Deposition: Veeco/Cambridge Nanotech Savannah S200 (Gen1 and 2)
Location: Chapman Hall – Cleanroom and B50
Uses:

Deposition of highly conformal metal-oxide films with precisely controlled thickness on planar substrates and high-aspect ratio features.

Specifications:

Oxygen sources: H2O and ozone
Reactor temperature: up to 190-300 C (depending on type of o-rings currently installed)
Maximum substrate diameter: 8”
Total precursor ports: 6
Nitrogen carrier gas purified to sub-parts-per billion (ppb)

Download Operating Procedure
Precursor List