Electron Beam Evaporator
Location: Chapman Hall - 313
Uses:
E-beam evaporation for high quality metal films.
Specifications:3 kW e-Gun evaporation source
Base pressure: ~1E-7 torr
4 crucible pockets
Water cooled substrate holder
Additional holder available for accommodating four 6" diameter substrates
Materials Available: Ag, Al, Au, Bi, Cr, Cu, In, Pd, Pt, SiO2, and Ti.
