FIB
Location: Chapman Hall - B30
Uses:
The dual electron and ion beam system allows for simultaneous SEM imaging and ion beam patterning with selective removal or addition of material.
Specifications:Ion Beam Specifications:
The Sidewinder FIB column consists of a gallium liquid metal ion source, LMIS.
Resolution: 5nm
Max horizontal field width: 2.5mm @ 5kV, corresponds to 50x minimum magnification.
Accelerating voltage: 1 – 30 kV
Probe current: 1.5 pA – 20 nA
Electron Beam Specifications:
The field emission electron column is equipped with an ultra-high brightness emitter and magnetic immersion lens technology.
Resolution: 0.9 nm at 15 kV, 1.5 nm at 1 kV
Accelerating voltage: 0.5 – 30 kV
Beam current: 20 nA
Detection: in-lens SE and BSE
