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Description: FEI Helios 600 Nanolab Dual Beam System
Location: Chapman Hall - B30

The dual electron and ion beam system allows for simultaneous SEM imaging and ion beam patterning with selective removal or addition of material.


Ion Beam Specifications:

The Sidewinder FIB column consists of a gallium liquid metal ion source, LMIS.
Resolution: 5nm
Max horizontal field width: 2.5mm @ 5kV, corresponds to 50x minimum magnification.
Accelerating voltage: 1 – 30 kV
Probe current: 1.5 pA – 20 nA

Electron Beam Specifications:
The field emission electron column is equipped with an ultra-high brightness emitter and magnetic immersion lens technology.

Resolution: 0.9 nm at 15 kV, 1.5 nm at 1 kV
Accelerating voltage: 0.5 – 30 kV
Beam current: 20 nA
Detection: in-lens SE and BSE

Download Operating Procedure