Electron Beam Evaporator
Location: Chapman Hall - Cleanroom
Uses:
E-beam evaporation for high quality metal films. Load lock enables deposition at E-8 torr pressure range within 15 minutes.
Specifications:5 kW e-Gun evaporation source
Base pressure: ~2E-8 torr
4 crucible pockets
Water cooled substrate holder
Loadlocked
Automated deposition rate and endpoint control
Materials Available: Ag, Al, Au, Cr, Pd, and Ti.
