Mask Aligner
Location: Chapman Hall - Cleanroom
Uses:
The mask aligner allows you to expose a photoresist through a mask to generate a pattern.
Specifications:Frontside and Backside Alignment
Up to 6″ substrates
350W lamp, 365nm and 405 nm, calibrated
A variety of chucks and mask holders available
Class 100 area
Resolution-2-3 µm in air
Alignment Accuracy TSA 0.5 µm, BSA 1 µm
