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microscopy
fabrication
spectroscopy

Mask Aligner

Description: Karl Suss MA6/BA6
Location: Chapman Hall - Cleanroom
Uses:

The mask aligner allows you to expose a photoresist through a mask to generate a pattern.

Specifications:

Frontside and Backside Alignment
Up to 6″ substrates
350W lamp, 365nm and 405 nm, calibrated
A variety of chucks and mask holders available
Class 100 area
Resolution-2-3 µm in air
Alignment Accuracy TSA 0.5 µm, BSA 1 µm

Download Operating Procedure